US Patent Issued to Applied Materials on May 13 for "Deposition of semiconductor integration films" (California, Michigan Inventors)

ALEXANDRIA, Va., June 12 -- United States Patent no. 12,300,491, issued on May 13, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Deposition of semiconductor integration films" was invented by Lakmal Charidu Kalutarage (San Jose, Calif.), Mark Joseph Saly (Milpitas, Calif.), Bhaskar Jyoti Bhuyan (Milpitas, Calif.), Thomas Joseph Knisley (Livonia, Mich.), Kelvin Chan (San Ramon, Calif.), Regina Germanie Freed (Los Altos, Calif.), David Michael Thompson (San Jose, Calif.), Susmit Singha Roy (Sunnyvale, Calif.) and Madhur Sachan (Belmont, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments disclosed herein include methods of depositing a metal oxo photoresist using dry deposition p...