US Patent Issued to APPLIED MATERIALS on March 4 for "Methods for increasing the density of high-index nanoimprint lithography films" (California Inventors)

ALEXANDRIA, Va., March 5 -- United States Patent no. 12,242,186, issued on March 4, was assigned to APPLIED MATERIALS Inc. (Santa Clara, Calif.).

"Methods for increasing the density of high-index nanoimprint lithography films" was invented by Andrew Ceballos (Palo Alto, Calif.), Rami Hourani (Santa Clara, Calif.), Kenichi Ohno (Sunnyvale, Calif.), Yuriy Melnik (San Jose, Calif.) and Amita Joshi (Fremont, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of the present disclosure generally relate to densified nanoimprint films and processes for making these densified nanoimprint films, as well as optical devices containing the densified nanoimprint films. In one or more embodiments, a densifie...