US Patent Issued to Applied Materials on March 25 for "Spot heating by moving a beam with horizontal rotary motion" (American, Japanese Inventors)

ALEXANDRIA, Va., March 26 -- United States Patent no. 12,261,062, issued on March 25, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Spot heating by moving a beam with horizontal rotary motion" was invented by Shu-Kwan Danny Lau (Sunnyvale, Calif.), Toshiyuki Nakagawa (Narita, Japan) and Zhiyuan Ye (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of the present disclosure generally relate to apparatus and methods for semiconductor processing, more particularly, to a thermal process chamber. In one or more embodiments, a process chamber comprises a first window, a second window, a substrate support disposed between the first window and the second window, and a motor...