US Patent Issued to Applied Materials on March 25 for "Doping techniques" (California Inventors)

ALEXANDRIA, Va., March 26 -- United States Patent no. 12,261,047, issued on March 25, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Doping techniques" was invented by Wolfgang Aderhold (Cupertino, Calif.), Yi-Chiau Huang (Fremont, Calif.), Wei Liu (San Jose, Calif.), Benjamin Colombeau (San Jose, Calif.) and Abhilash Mayur (Salinas, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of selectively and conformally doping semiconductor materials is disclosed. Some embodiments utilize a conformal dopant film deposited selectively on semiconductor materials by thermal decomposition. Some embodiments relate to doping non-line of sight surfaces. Some embodiments relate to methods for f...