ALEXANDRIA, Va., March 19 -- United States Patent no. 12,253,476, issued on March 18, was assigned to Applied Materials Inc. (Santa Clara, Calif.).
"Multi-level RF pulse monitoring and RF pulsing parameter optimization at a manufacturing system" was invented by Dermot Cantwell (Sunnyvale, Calif.), Quentin Ernie Walker (Fremont, Calif.), Serghei Malkov (Hayward, Calif.) and Jatinder Kumar (Milpitas, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Methods and systems for RF pulse monitoring and RF pulsing parameter optimization at a manufacturing system are provided. Sensor data is received from one or more sensors that indicates an RF pulse waveform detected within the processing chamber. One or more RF...