US Patent Issued to Applied Materials on March 18 for "Integrated cleaning process for substrate etching" (California Inventors)

ALEXANDRIA, Va., March 19 -- United States Patent no. 12,255,055, issued on March 18, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Integrated cleaning process for substrate etching" was invented by Yi Zhou (Fremont, Calif.), Seul Ki Ahn (San Jose, Calif.), Seung-Young Son (Santa Clara, Calif.), Li-Te Chang (Sunnyvale, Calif.), Sunil Srinivasan (Pleasanton, Calif.) and Rajinder Dhindsa (Pleasanton, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for removing etchant byproduct from an etch reactor and discharging a substrate from an electrostatic chuck of the etch reactor is provided. One or more layers on a substrate electrostatically secured to an electrostatic chuck within a...