US Patent Issued to Applied Materials on March 11 for "Universal metrology file, protocol, and process for maskless lithography systems" (California Inventors)

ALEXANDRIA, Va., March 12 -- United States Patent no. 12,248,254, issued on March 11, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Universal metrology file, protocol, and process for maskless lithography systems" was invented by Tamer Coskun (San Jose, Calif.), Jang Fung Chen (Cupertino, Calif.) and Douglas Joseph Van Den Broeke (Sunnyvale, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of the present disclosure relate to a system, a software application, and a method of a lithography process to update one or more of a mask pattern, maskless lithography device parameters, lithography process parameters utilizing a file readable by each of the components of a lithography e...