ALEXANDRIA, Va., March 12 -- United States Patent no. 12,249,511, issued on March 11, was assigned to Applied Materials Inc. (Santa Clara, Calif.).
"Treatments to improve device performance" was invented by Steven C. H. Hung (Sunnyvale, Calif.), Lin Dong (San Jose, Calif.), Benjamin Colombeau (San Jose, Calif.), Johanes F. Swenberg (Los Gatos, Calif.) and Linlin Wang (Fremont, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method of forming a semiconductor structure includes annealing a surface of a substrate in an ambient of hydrogen to smooth the surface, pre-cleaning the surface of the substrate, depositing a high-Kappa dielectric layer on the pre-cleaned surface of the substrate, performing a re...