ALEXANDRIA, Va., March 12 -- United States Patent no. 12,249,494, issued on March 11, was assigned to Applied Materials Inc. (Santa Clara, Calif.).
"Remote plasma cleaning of chambers for electronics manufacturing systems" was invented by Yuanhong Guo (Mountain View, Calif.), Sheng Guo (Santa Clara, Calif.), Marek Radko (San Jose, Calif.), Steve Sansoni (Livermore, Calif.), Xiaoxiong Yuan (San Jose, Calif.), See-Eng Phan (Santa Clara, Calif.), Yuji Murayama (Los Gatos, Calif.), Pingping Gou (San Mateo, Calif.) and Song-Moon Suh (Seoul, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method of cleaning a chamber for an electronics manufacturing system includes flowing a gas mixture comprising oxy...