US Patent Issued to APPLIED MATERIALS on March 11 for "Methods and apparatus for controlling radio frequency electrode impedances in process chambers" (Chinese, American Inventors)

ALEXANDRIA, Va., March 12 -- United States Patent no. 12,249,484, issued on March 11, was assigned to APPLIED MATERIALS Inc. (Santa Clara, Calif.).

"Methods and apparatus for controlling radio frequency electrode impedances in process chambers" was invented by Jian Janson Chen (Fremont, Calif.), Yi Yang (Xi'an, China), Chong Ma (Xi'an, China) and Yuan Xue (Xi'an, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods and apparatus for controlling plasma in a process chamber leverage an RF termination filter which provides an RF path to ground. In some embodiments, an apparatus may include a DC filter configured to be electrically connected between a DC power supply and electrodes embedded in an electro...