US Patent Issued to Applied Materials on June 3 for "Epitaxial deposition chamber" (American, Japanese, Indian Inventors)

ALEXANDRIA, Va., June 4 -- United States Patent no. 12,324,061, issued on June 3, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Epitaxial deposition chamber" was invented by Shu-Kwan Lau (Sunnyvale, Calif.), Brian Hayes Burrows (San Jose, Calif.), Zhiyuan Ye (San Jose, Calif.), Richard O. Collins (Santa Clara, Calif.), Enle Choo (Saratoga, Calif.), Danny D. Wang (San Jose, Calif.), Shainish Nellikka (Bangalore, India), Toshiyuki Nakagawa (Narita, Japan), Abhishek Dube (Fremont, Calif.), Ala Moradian (Sunnyvale, Calif.) and Kartik Bhupendra Shah (Saratoga, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A process chamber includes a chamber body having a ceiling disposed above a floor wi...