US Patent Issued to APPLIED MATERIALS on June 24 for "Shutter disk for physical vapor deposition (PVD) chamber" (Indian, American Inventors)

ALEXANDRIA, Va., June 25 -- United States Patent no. 12,338,527, issued on June 24, was assigned to APPLIED MATERIALS Inc. (Santa Clara, Calif.).

"Shutter disk for physical vapor deposition (PVD) chamber" was invented by Zhiyong Wang (San Jose, Calif.), Halbert Chong (San Jose, Calif.), Irena H. Wysok (San Jose, Calif.), Jianxin Lei (Fremont, Calif.), Rongjun Wang (Dublin, Calif.), Lei Zhou (San Jose, Calif.), Kirankumar Neelasandra Savandaiah (Bangalore, India) and Sundarapandian Ramalinga Vijayalakshmi Reddy (Bangalore, India).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods and apparatus reduce defects in substrates processed in a physical vapor (PVD) chamber. In some embodiments, a method for cleani...