ALEXANDRIA, Va., June 25 -- United States Patent no. 12,340,980, issued on June 24, was assigned to Applied Materials Inc. (Santa Clara, Calif.).
"Plasma showerhead with improved uniformity" was invented by Chaowei Wang (San Diego), Kenneth Brian Doering (San Jose, Calif.), Hanhong Chen (Milpitas, Calif.), Kartik Shah (Saratoga, Calif.), Kevin Griffin (Livermore, Calif.) and Hao Zhang (Newark, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Plasma showerheads with improved gas uniformity, and a plasma showerhead with angled gas nozzles are disclosed. Also disclosed are gas nozzles having a vertical offset angle and/or a directional offset angle. None of the gas channels and/or the gas nozzles intersect...