ALEXANDRIA, Va., June 19 -- United States Patent no. 12,330,260, issued on June 17, was assigned to Applied Materials Inc. (Santa Clara, Calif.).
"Polishing pad with secondary window seal" was invented by Rajkumar Alagarsamy (Sunnyvale, Calif.), Yongqi Hu (Fremont, Calif.), Simon Yavelberg (Cupertino, Calif.), Periya Gopalan (San Jose, Calif.) and Christopher R. Mahon (San Bruno, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A polishing article has a polishing surface and an aperture, the aperture including a first section and a second section. The polishing article includes a projection extending inwardly into the aperture. The polishing article includes a lower portion on a side of the first surfac...