US Patent Issued to Applied Materials on June 17 for "Integration processes utilizing boron-doped silicon materials" (American, Japanese Inventors)

ALEXANDRIA, Va., June 19 -- United States Patent no. 12,334,358, issued on June 17, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Integration processes utilizing boron-doped silicon materials" was invented by Takehito Koshizawa (San Jose, Calif.), Karthik Janakiraman (San Jose, Calif.), Rui Cheng (San Jose, Calif.), Krishna Nittala (San Jose, Calif.), Menghui Li (Mountain View, Calif.), Ming-Yuan Chuang (Boise, Idaho), Susumu Shinohara (Yokohama, Japan), Juan Guo (San Jose, Calif.), Xiawan Yang (San Jose, Calif.), Russell Chin Yee Teo (Palo Alto, Calif.), Zihui Li (Santa Clara, Calif.), Chia-Ling Kao (San Jose, Calif.), Qu Jin (Santa Clara, Calif.) and Anchuan Wang (San Jose, Calif.).

According to the abstract* released b...