US Patent Issued to Applied Materials on June 17 for "Dual membrane carrier head for chemical mechanical polishing" (California Inventors)

ALEXANDRIA, Va., June 19 -- United States Patent no. 12,330,262, issued on June 17, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Dual membrane carrier head for chemical mechanical polishing" was invented by Steven M. Zuniga (Soquel, Calif.), Jay Gurusamy (Santa Clara, Calif.) and Andrew J. Nagengast (Sunnyvale, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A carrier head for chemical mechanical polishing includes a base assembly and a membrane assembly connected to the base assembly. The membrane assembly includes a membrane support, an inner membrane secured to the membrane support, wherein the inner membrane forms a plurality of individually pressurizable inner chambers between an...