US Patent Issued to Applied Materials on June 17 for "Circuits for edge ring control in shaped dc pulsed plasma process device" (California Inventors)

ALEXANDRIA, Va., June 19 -- United States Patent no. 12,334,311, issued on June 17, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Circuits for edge ring control in shaped dc pulsed plasma process device" was invented by Linying Cui (Cupertino, Calif.) and James Rogers (Los Gatos, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure relates to an apparatus and method that manipulate the voltage at an edge ring relative to a substrate located on a substrate support assembly. The substrate support assembly has a body having a substrate support portion having a substrate electrode embedded therein for applying a substrate voltage to a substrate. The body of the substrate ...