US Patent Issued to Applied Materials on June 17 for "Chemical-dose substrate deposition monitoring" (California Inventors)

ALEXANDRIA, Va., June 19 -- United States Patent no. 12,333,700, issued on June 17, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Chemical-dose substrate deposition monitoring" was invented by Albert Barrett Hicks III (Sunnyvale, Calif.) and Serghei Malkov (Hayward, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method including receiving, by a processing device, image data characterizing light reflected from of a film disposed on a processed surface of a substrate. The image data corresponds to one or more locations across a surface of the film and indicates a camera perspective angle associated with capturing the image data. The method further includes determining, by the processi...