US Patent Issued to Applied Materials on June 10 for "Integrated semiconductor part cleaning system" (California Inventors)

ALEXANDRIA, Va., June 18 -- United States Patent no. 12,327,738, issued on June 10, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Integrated semiconductor part cleaning system" was invented by Jenn C. Chow (San Jose, Calif.), David W. Groechel (Los Altos Hills, Calif.), Tuochuan Huang (Saratoga, Calif.), Dorothea Buechel-Rimmel (Sunnyvale, Calif.), Han Wang (Palo Alto, Calif.), Li Wu (Fremont, Calif.) and Gang Peng (Fremont, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments described herein relate to chamber component cleaning systems and methods for cleaning a chamber component. The chamber component cleaning system includes a spray station, at least a first cleaning station...