US Patent Issued to Applied Materials on June 10 for "Deposition of conformal and gap-fill amorphous silicon thin-films" (California Inventors)

ALEXANDRIA, Va., June 18 -- United States Patent no. 12,325,910, issued on June 10, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Deposition of conformal and gap-fill amorphous silicon thin-films" was invented by Yihong Chen (San Jose, Calif.), Rui Cheng (Santa Clara, Calif.), Pramit Manna (Sunnyvale, Calif.), Kelvin Chan (San Ramon, Calif.), Karthik Janakiraman (San Jose, Calif.), Abhijit Basu Mallick (Palo Alto, Calif.) and Srinivas Gandikota (Santa Clara, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods for depositing film comprising cyclical exposure of a substrate surface to a precursor and a degas environment to remove gas evolved from the film. Some embodiments further co...