US Patent Issued to Applied Materials on July 8 for "Plasma based film modification for semiconductor devices" (Massachusetts Inventors)

ALEXANDRIA, Va., July 9 -- United States Patent no. 12,351,900, issued on July 8, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Plasma based film modification for semiconductor devices" was invented by Timothy J. Miller (Ipswich, Mass.) and Vikram M. Bhosle (North Reading, Mass.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed herein are approaches for treating a film layer of a semiconductor device to modify an etch resistance of the film later. In one approach, a method may include forming a first film over a substrate base, depositing a second film over the first film, and introducing an inert species into the second film while the second film is deposited over the first film, whe...