ALEXANDRIA, Va., July 9 -- United States Patent no. 12,351,909, issued on July 8, was assigned to Applied Materials Inc. (Santa Clara, Calif.).
"Gap fill methods using catalyzed deposition" was invented by Byunghoon Yoon (Sunnyvale, Calif.), Liqi Wu (San Jose, Calif.), Joung Joo Lee (San Jose, Calif.), Kai Wu (Palo Alto, Calif.), Xi Cen (San Jose, Calif.), Wei Lei (Campbell, Calif.), Sang Ho Yu (Cupertino, Calif.) and Seshadri Ganguli (Sunnyvale, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Methods of depositing a metal film are discussed. A metal film is formed on the bottom of feature having a metal bottom and dielectric sidewalls. Formation of the metal film comprises exposure to a metal precurso...