US Patent Issued to Applied Materials on July 29 for "Controlling light source wavelengths for selectable phase shifts between pixels in digital lithography systems" (California Inventors)

ALEXANDRIA, Va., July 30 -- United States Patent no. 12,372,779, issued on July 29, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Controlling light source wavelengths for selectable phase shifts between pixels in digital lithography systems" was invented by Thomas L. Laidig (Richmond, Calif.), Christopher Bencher (Cupertino, Calif.), Hwan J. Jeong (Los Altos, Calif.) and Uwe Hollerbach (Fremont, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A digital lithography system may adjust a wavelength of the light source to compensate for tilt errors in micromirrors while maintaining a perpendicular direction for the reflected light. Adjacent pixels may have a phase shift that is determined b...