ALEXANDRIA, Va., July 23 -- United States Patent no. 12,366,481, issued on July 22, was assigned to Applied Materials Inc. (Santa Clara, Calif.).
"Reflector plate for substrate processing" was invented by Wolfgang R. Aderhold (Cupertino, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of the present disclosure generally relate to apparatus for processing a substrate, and more specifically to reflector plates for rapid thermal processing. In an embodiment, a reflector plate assembly for processing a substrate is provided. The reflector plate assembly includes a reflector plate body, a plurality of sub-reflector plates disposed within the reflector plate body, and a plurality of pyrometers. A...