US Patent Issued to Applied Materials on July 22 for "Pulsed voltage source for plasma processing applications" (California Inventors)

ALEXANDRIA, Va., July 23 -- United States Patent no. 12,368,020, issued on July 22, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Pulsed voltage source for plasma processing applications" was invented by A N M Wasekul Azad (Santa Clara, Calif.), Kartik Ramaswamy (San Jose, Calif.), Yang Yang (San Diego), Yue Guo (Redwood City, Calif.) and Fernando Silveira (Santa Clara, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments provided herein generally include apparatus, e.g., plasma processing systems, and methods for the plasma processing of a substrate in a processing chamber. Some embodiments are directed to a waveform generator. The waveform generator generally includes a first ...