US Patent Issued to APPLIED MATERIALS on July 22 for "Methods and apparatus for physical vapor deposition (PVD) dielectric deposition" (California Inventors)

ALEXANDRIA, Va., July 23 -- United States Patent no. 12,368,033, issued on July 22, was assigned to APPLIED MATERIALS Inc. (Santa Clara, Calif.).

"Methods and apparatus for physical vapor deposition (PVD) dielectric deposition" was invented by Jothilingam Ramalingam (Milpitas, Calif.) and William Fruchterman (Sunnyvale, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods and apparatus for reducing burn-in time of a physical vapor deposition shield, including: sputtering a dielectric target having a first dielectric constant to form a dielectric layer upon an inner surface of a shield, wherein the shield includes an aluminum oxide coating having a second dielectric constant in an amount sufficient t...