ALEXANDRIA, Va., July 23 -- United States Patent no. 12,365,060, issued on July 22, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Chemical mechanical polishing correction tool" was invented by Jay Gurusamy (Santa Clara, Calif.) and Steven M. Zuniga (Soquel, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A chemical mechanical polishing touch-up tool includes a pedestal configured to support a substrate, a plurality of jaws configured to center the substrate on the pedestal, a loading ring to apply pressure to an annular region on a back side of the substrate on the pedestal, a polishing ring to bring a polishing material into contact with an annular region on a front side of the substr...