US Patent Issued to Applied Materials on July 15 for "Methods of forming thermally stable carbon film" (California Inventors)

ALEXANDRIA, Va., July 16 -- United States Patent no. 12,362,181, issued on July 15, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Methods of forming thermally stable carbon film" was invented by Eswaranand Venkatasubramanian (Santa Clara, Calif.), Rajaram Narayanan (Santa Clara, Calif.), Pramit Manna (Santa Clara, Calif.), Abhijit B. Mallick (Fremont, Calif.), Karthik Janakiraman (San Jose, Calif.) and Jialiang Wang (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of processing a substrate is provided including flowing a deposition gas comprising a hydrocarbon compound and a dopant compound into a process volume having a substrate disposed positioned on a substrate s...