US Patent Issued to Applied Materials on July 1 for "System and method for radical and thermal processing of substrates" (California Inventors)

ALEXANDRIA, Va., July 3 -- United States Patent no. 12,347,679, issued on July 1, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"System and method for radical and thermal processing of substrates" was invented by Xinming Zhang (Santa Clara, Calif.), Abhilash J. Mayur (Salinas, Calif.), Shashank Sharma (Fremont, Calif.), Norman L. Tam (Cupertino, Calif.) and Matthew Spuller (Belmont, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure provides systems and methods for processing channel structures of substrates that include positioning the substrate in a first processing chamber having a first processing volume. The substrate includes a channel structure with high aspec...