ALEXANDRIA, Va., July 3 -- United States Patent no. 12,347,647, issued on July 1, was assigned to Applied Materials Inc. (Santa Clara, Calif.).
"Plasma excitation with ion energy control" was invented by Yang Yang (San Diego), Yue Guo (Redwood City, Calif.) and Kartik Ramaswamy (San Jose, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments provided herein generally include apparatus, plasma processing systems and methods for generation of a waveform for plasma processing of a substrate in a processing chamber. One embodiment includes a waveform generator having a voltage source selectively coupled to an output node, where the output node is configured to be coupled to an electrode disposed with...