ALEXANDRIA, Va., July 3 -- United States Patent no. 12,347,652, issued on July 1, was assigned to Applied Materials Inc. (Santa Clara, Calif.).
"Method for forming plasma coating" was invented by Lance A. Scudder (Sunnyvale, Calif.), Sukti Chatterjee (San Jose, Calif.), David Masayuki Ishikawa (Mountain View, Calif.), Yuriy V. Melnik (San Jose, Calif.) and Vibhas Singh (San Jose, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Exemplary methods of forming a coating of material on a substrate may include forming a plasma of a first precursor and an oxygen-containing precursor. The first precursor and the oxygen-containing precursor may be provided in a first flow rate ratio. The methods may include depo...