ALEXANDRIA, Va., July 3 -- United States Patent no. 12,347,674, issued on July 1, was assigned to Applied Materials Inc. (Santa Clara, Calif.).
"Directional selective deposition" was invented by Bhargav S. Citla (Fremont, Calif.), Soham Asrani (San Jose, Calif.), Joshua Rubnitz (Monte Sereno, Calif.), Srinivas D. Nemani (Saratoga, Calif.) and Ellie Y. Yieh (San Jose, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Exemplary processing methods may include forming a plasma of a silicon-containing precursor. The methods may include depositing a flowable film on a semiconductor substrate with plasma effluents of the silicon-containing precursor. The processing region may be at least partially defined betwe...