US Patent Issued to Applied Materials on Jan. 28 for "Edge defect detection via image analytics" (Indian, Taiwanese, Singaporean Inventors)

ALEXANDRIA, Va., Jan. 29 -- United States Patent no. 12,211,195, issued on Jan. 28, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Edge defect detection via image analytics" was invented by Yash Chhabra (Bangalore, India), Abyaya Dhar (Bangalore, India), Joseph Liu (Zhubei, Taiwan), Yi Nung Wu (Taoyuan, Taiwan), Boon Sen Chan (Singapore), Sidda Reddy Kurakula (Bengaluru, India) and Chandrasekhar Roy (Bangalore, India).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure includes edge defect detection via image analytics. A method includes identifying an image of an edge of a susceptor pocket formed by a susceptor of a substrate processing system. The method further includes pr...