ALEXANDRIA, Va., Jan. 28 -- United States Patent no. 12,533,717, issued on Jan. 27, was assigned to Applied Materials Inc. (Santa Clara, Calif.).
"Process chamber clean" was invented by Wolfgang R. Aderhold (Cupertino, Calif.), Karthik Raman Sharma (Fremont, Calif.) and Yi Wang (Sunnyvale, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method of cleaning a process chamber is provided including supplying a plasma from a remote plasma source to an interior volume of a rapid thermal processing chamber during a first time period, the rapid thermal processing chamber including a plurality of lamps configured to heat an interior volume of the rapid thermal processing chamber; and providing heat from the p...