US Patent Issued to Applied Materials on Jan. 27 for "Capacitive sensing data integration for plasma chamber condition monitoring" (American, Indian Inventors)

ALEXANDRIA, Va., Jan. 28 -- United States Patent no. 12,537,179, issued on Jan. 27, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Capacitive sensing data integration for plasma chamber condition monitoring" was invented by Yaoling Pan (San Jose, Calif.), Patrick John Tae (Palo Alto, Calif.), Michael D. Willwerth (Campbell, Calif.), Leonard Tedeschi (San Jose, Calif.), Kiyki-Shiy N Shang (Santa Clara, Calif.), Mikhail V. Taraboukhine (Pleasanton, Calif.), Charles R. Hardy (San Jose, Calif.) and Sivasankar Nagarajan (Bangalore, India).

According to the abstract* released by the U.S. Patent & Trademark Office: "Capacitive sensors and capacitive sensing data integration for plasma chamber condition monitoring are described. I...