US Patent Issued to APPLIED MATERIALS on Jan. 20 for "Electrostatic chuck with multiple radio frequency meshes to control plasma uniformity" (California Inventors)

ALEXANDRIA, Va., Jan. 20 -- United States Patent no. 12,531,206, issued on Jan. 20, was assigned to APPLIED MATERIALS Inc. (Santa Clara, Calif.).

"Electrostatic chuck with multiple radio frequency meshes to control plasma uniformity" was invented by Edward P. Hammond IV (Hillsborough, Calif.) and Jonghoon Baek (Saratoga, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure relates to a method and apparatus for controlling a plasma sheath near a substrate edge. Changing the voltage/current distribution across the inner electrode and the outer electrode with in the substrate assembly facilitates the spatial distribution of the plasma across the substrate. The method includes providing a...