US Patent Issued to Applied Materials on Jan. 13 for "Semiconductor fabrication using machine learning approach to generating process control parameters" (California Inventors)

ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,524,675, issued on Jan. 13, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Semiconductor fabrication using machine learning approach to generating process control parameters" was invented by Sivakumar Dhandapani (San Jose, Calif.) and Jun Qian (Sunnyvale, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for processing substrates includes subjecting each respective first substrate of a first plurality of substrates to a process that modifies a thickness of an outer layer of the respective first substrate, generating a plurality of groups of process parameter values; generating a plurality of removal profiles, training an art...