US Patent Issued to Applied Materials on Jan. 13 for "Prevention of contamination of substrates during pressure changes in processing systems" (California, Texas Inventors)

ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,523,380, issued on Jan. 13, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Prevention of contamination of substrates during pressure changes in processing systems" was invented by Robert A. Medure (Santa Clara, Calif.), Raechel Chu-Hui Tan (San Francisco), Changgong Wang (San Jose, Calif.), Yuanhong Guo (Mountain View, Calif.), Sai Padhy (San Jose, Calif.), Ashley M. Okada (San Jose, Calif.), Kenneth Le (Fremont, Calif.), Atilla Kilicarslan (Mountain View, Calif.) and Dean C. Hruzek (Cedar Park, Texas).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed are implementations for minimizing substrate contamination during pressure change...