ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,525,441, issued on Jan. 13, was assigned to Applied Materials Inc. (Santa Clara, Calif.).
"Plasma chamber and chamber component cleaning methods" was invented by Rajinder Dhindsa (Pleasanton, Calif.), Linying Cui (Cupertino, Calif.) and James Rogers (Los Gatos, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments provided herein generally include plasma processing systems configured to preferentially clean desired surfaces of a substrate support assembly by manipulating one or more characteristics of an in-situ plasma and related methods. In one embodiment, a plasma processing method includes generating a plasma in a processing region defin...