US Patent Issued to Applied Materials on Jan. 13 for "Method for cleaning a vacuum system, method for vacuum processing of a substrate, and apparatus for vacuum processing a substrate" (German Inventor)

ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,522,915, issued on Jan. 13, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Method for cleaning a vacuum system, method for vacuum processing of a substrate, and apparatus for vacuum processing a substrate" was invented by Manuel Radek (Aschaffenburg, Germany).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for cleaning a vacuum chamber, particularly a vacuum chamber used in the manufacture of OLED devices is described. The method includes cleaning at least one of an inside of the vacuum chamber and a component inside the vacuum chamber with active species, a process gas for generating the active species includes at least 90% oxyge...