US Patent Issued to Applied Materials on Jan. 13 for "Integrated clean and dry module for cleaning a substrate" (American, Indian Inventors)

ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,525,468, issued on Jan. 13, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Integrated clean and dry module for cleaning a substrate" was invented by Jason A. Rye (Kalispell, Mont.), Adrian S. Blank (Gilroy, Calif.), Ekaterina Mikhaylichenko (San Jose, Calif.), Jagan Rangarajan (San Jose, Calif.), Jagadeeshkumar Sukumaran (Santa Clara, Calif.), Manikandan Jayaraman (Santa Clara, Calif.), Ricardo Martinez (Manteca, Calif.) and Retheesh Muralidharan (Bangalore, India).

According to the abstract* released by the U.S. Patent & Trademark Office: "In one embodiment, a cleaning and drying module includes a process rotor having grip pins for holding a substrate. The process ro...