US Patent Issued to Applied Materials on Feb. 3 for "System and method for detecting a membrane failure in a chemical mechanical polishing system" (California Inventors)

ALEXANDRIA, Va., Feb. 3 -- United States Patent no. 12,539,577, issued on Feb. 3, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"System and method for detecting a membrane failure in a chemical mechanical polishing system" was invented by Chang Zhang (Santa Clara, Calif.), Jian J. Chen (Fremont, Calif.), Quoc Truong (San Ramon, Calif.) and Jamie Stuart Leighton (Palo Alto, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A polishing system includes a pressure system, a substrate carrier including a membrane, a first sensor, and a control system. A first compartment of the membrane is fluidly coupled to the pressure system. The first sensor is configured to monitor the pressure system and...