US Patent Issued to APPLIED MATERIALS on Feb. 3 for "Multi-flow gas circuits, processing chambers, and related apparatus and methods for semiconductor manufacturing" (California Inventors)

ALEXANDRIA, Va., Feb. 3 -- United States Patent no. 12,540,400, issued on Feb. 3, was assigned to APPLIED MATERIALS Inc. (Santa Clara, Calif.).

"Multi-flow gas circuits, processing chambers, and related apparatus and methods for semiconductor manufacturing" was invented by Zuoming Zhu (Sunnyvale, Calif.), Shu-Kwan Lau (Sunnyvale, Calif.), Errol Antonio C. Sanchez (Tracy, Calif.), Abhishek Dube (Fremont, Calif.) and Ala Moradian (Sunnyvale, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of the present disclosure relate to multi-flow gas circuits, processing chambers, and related apparatus and methods applicable for semiconductor manufacturing. In one or more embodiments, a processing chambe...