US Patent Issued to Applied Materials on Feb. 3 for "Isolation for reactor for deposition of films onto particles" (Indian, American Inventors)

ALEXANDRIA, Va., Feb. 3 -- United States Patent no. 12,539,526, issued on Feb. 3, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Isolation for reactor for deposition of films onto particles" was invented by Brian Hayes Burrows (San Jose, Calif.), Sekar Krishnasamy (Bangalore, India), Ayyanagouda Raravi (Bangalore, India), Monika Mudalkar (Karnataka, India), Govindraj Desai (Karnataka, India), Hemantha Kumar Raju (Bangalore, India), Basavaraj Pattanshetty (Bangalore, India), David Masayuki Ishikawa (Mountain View, Calif.), Visweswaren Sivaramakrishnan (Cupertino, Calif.), Shrikant Swaminathan (Santa Clara, Calif.), Mario Cambron (San Jose, Calif.), Robert Navasca (Union City, Calif.), Miaojun Wang (Santa Clara, Calif.) and J...