US Patent Issued to Applied Materials on Feb. 18 for "In-line metrology systems, apparatus, and methods for optical devices" (California Inventors)

ALEXANDRIA, Va., Feb. 19 -- United States Patent no. 12,229,940, issued on Feb. 18, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"In-line metrology systems, apparatus, and methods for optical devices" was invented by Yangyang Sun (San Jose, Calif.), Jinxin Fu (Fremont, Calif.), Kazuya Daito (Milpitas, Calif.) and Ludovic Godet (Sunnyvale, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of the present disclosure relate to optical devices for augmented, virtual, and/or mixed reality applications. In one or more embodiments, an optical device metrology system is configured to measure a plurality of first metrics and one or more second metrics for optical devices, the one or mo...