ALEXANDRIA, Va., Feb. 12 -- United States Patent no. 12,224,198, issued on Feb. 11, was assigned to Applied Materials Inc. (Santa Clara, Calif.).
"Electrostatic chuck with mesas" was invented by Vijay D. Parkhe (San Jose, Calif.) and Ashutosh Agarwal (San Jose, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Electrostatic chucks (ESCs) for plasma processing chambers, and methods of fabricating ESCs, are described. In an example, a substrate support assembly includes a ceramic top plate having a top surface with a processing region. One or more electrodes is within the ceramic top plate. A plurality of mesas is within the processing region and on the top surface of the ceramic plate or vertically over a...