US Patent Issued to Applied Materials on Feb. 10 for "Detecting an excursion of a CMP component using time-based sequence of images" (California Inventors)

ALEXANDRIA, Va., Feb. 11 -- United States Patent no. 12,548,146, issued on Feb. 10, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Detecting an excursion of a CMP component using time-based sequence of images" was invented by Sidney P. Huey (Fremont, Calif.), Thomas Li (Santa Clara, Calif.) and Benjamin Cherian (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Monitoring operations of a polishing system includes obtaining a time-based sequence of reference images of a component of the polishing system performing operations during a test operation of the polishing system, receiving from a camera a time-based sequence of monitoring images of an equivalent component of an equivale...