US Patent Issued to Applied Materials on Dec. 30 for "Semiconductor chamber components with high-performance coating" (California Inventor)

ALEXANDRIA, Va., Dec. 31 -- United States Patent no. 12,512,361, issued on Dec. 30, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Semiconductor chamber components with high-performance coating" was invented by Laksheswar Kalita (Milpitas, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Exemplary semiconductor processing chambers may include a chamber body. The chambers may include a showerhead. The chambers may include a substrate support. The substrate support may include a platen characterized by a first surface facing the showerhead. The substrate support may include a shaft coupled with the platen along a second surface of the platen opposite the first surface of the platen. The sh...