ALEXANDRIA, Va., Dec. 31 -- United States Patent no. 12,512,304, issued on Dec. 30, was assigned to Applied Materials Inc. (Santa Clara, Calif.).
"Plasma source for semiconductor processing" was invented by Vladimir Nagorny (Tracy, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present technology encompasses plasma sources including a first plate defining a first plurality of apertures arranged in a first set of rows. The first plate may include a first set of electrodes extending along a separate row of the first set of rows. The plasma sources may include a second plate defining a second plurality of apertures arranged in a second set of rows. The second plate may include a second set of electro...