ALEXANDRIA, Va., Dec. 23 -- United States Patent no. 12,503,766, issued on Dec. 23, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Vapor concentration sensors for process chambers" was invented by William Durand (San Francisco), Abdullah Zafar (Santa Clara, Calif.), Usman Chowdhury (Santa Clara, Calif.), Amir Bayati (San Jose, Calif.), Farzad Houshmand (Mountain View, Calif.), David J. Coumou (Webster, N.Y.), Kasturi Sarang (San Jose, Calif.) and Kenric Choi (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Vapor concentration sensors for deposition process or deposition chamber condition monitoring are described. In an example, a deposition system includes a deposition chamber...